Abhishek Shendre of D2S describes how PLDC can make curvy mask shapes manufactureable for improved wafer quality. Leo Pang of D2S presents Abhishek's talk in Chinese.
Jim Wiley, Chan-Uk Jeon, and Harry Levinson (pictured left to right) debate the results of this year's Luminaries Survey at the eBeam Initiative annual reception with Aki Fujimura as moderator.
SPIE BACUS Webinar Series: "All Manufacturable Shapes are Curvy: Ask for What You Can Get and Get What You Ask For," Aki Fujimura of D2S talks about curvilinear masks as well as wafer targets, with the end goal being manufacturability. Scroll to bottom of page; may require login
Leo Pang explains why pixel-level dose correction (PLDC) could be the most significant topic at PMJ 2025, from Micron’s talk on PLDC vs off-line MPC for curvilinear and Manhattan features (Best Paper Award at PMJ), to Tekscend and NuFlare’s joint-poster on PLDC results for N-CAR resist patterns (Best Poster Award at PMJ).
