Products & Technologies
About D
2
S
Curvilinear
News
Community
Videos
Join D
2
S
Contact Us
Menu
D
2
S Extends GPU-Accelerated Wafer-Plane Analysis to EUV Photomasks
D
2
S TrueMask
®
WPA enables fast and accurate simulation of complex and curvilinear mask shapes for cost-effective CD metrology
Technologies
GPU Acceleration
Deep Learning
MB-MDP & MPC
Curvilinear
Products
CDP
TrueMask
®
ILT
TrueMask
®
MDP
TrueMask
®
DS
TrueMask
®
DLK
TrueModel
®
TrueMask
®
WPA
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Technology
GPU Acceleration
Deep Learning
MB-MDP & MPC
Curvilinear
Products
CDP
TrueMask
®
ILT
TrueMask
®
MDP
TrueMask
®
DS
TrueMask
®
DLK
TrueModel
®
TrueMask
®
WPA
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Information
News
Community
Videos
Join D
2
S
Contact Us
Menu
Agency Contact
Tel:
Email:
Download PDF
English
中文 (繁體)
中文 (简体)
日本語
Press Release • February 25, 2020
