Semiconductor Engineering: Multi-Beam Mask Writers Are A Game Changer

The eBeam Initiative’s 11th annual Luminaries survey in 2022 reported EUV fueling growth of the semiconductor photomask industry while a panel of experts cited a number of complications in moving to High-NA EUV during an event co-located with the SPIE Photomask Technology Conference in late September. Industry luminaries representing 44 companies from across the semiconductor ecosystem participated in this year’s survey. Aki Fujimura, CEO of D2S, Inc., the managing company sponsor of the eBeam Initiative, moderated the panel discussion. This is the second and final part of the panel discussion.