SPIE Advanced Lithography 2020: TrueMask® ILT MWCO: Full-chip curvilinear ILT in a day and full mask multi-beam and VSB writing in 12 hrs for 193i

Linyong (Leo) Pang, P. Jeffrey Ungar, Ali Bouaricha , Lu Sha, Michael Pomerantsev, Mariusz Niewczas, Kechang Wang, Bo Su, Ryan Pearman, and Aki Fujimura, "TrueMask® ILT MWCO: Full-chip curvilinear ILT in a day and full mask multi-beam and VSB writing in 12 hrs for 193i," Proc. SPIE 11327, Optical Microlithography XXXIII, 113270K (Presented at SPIE Advanced Lithography: February 26, 2020; Published: 31 March 2020); https://doi.org/10.1117/12.2554867.