SPIE Photomask Technology 2019: Adopting Curvilinear Shapes for Production ILT: Challenges and Opportunities

Ryan Pearman, Jeff Ungar, Nagesh Shirali, Abishek Shendre, Mariusz Niewczas, Leo Pang, Aki Fujimura, “Adopting curvilinear shapes for production ILT: challenges and opportunities,” Proc. SPIE 11148, Photomask Technology 2019 (October 10, 2019). DOI: https://doi.org/10.1117/12.2538445