SPIE Photomask Technology 2020: Enabling faster VSB writing of 193i curvilinear ILT masks that improve wafer process windows for advanced memory applications

Linyong (Leo) Pang, Ezequiel V Russell, Bill Baggenstoss, Yang Lu, Michael Lee, Jennefir Ping Digaum, Ming-Chuan Yang, Ryan Pearman, P. Jeffrey Ungar, Lu Sha, Ali Bouaricha, Michael Pomerantsev, Mariusz Niewczas, Kechang Wang, Bo Su, Michael Meyer, Aki Fujimura, "Enabling faster VSB writing of 193i curvilinear ILT masks that improve wafer process windows for advanced memory applications," Proc. SPIE 11518, Photomask Technology 2020, 115180W (7 October 2020); https://doi.org/10.1117/12.2579729