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D2S CEO Aki Fujimura's second blog in the series explains how improving mask manufacturing is the simplest way to reduce wafer variation.
Presented by D2S CEO Aki Fujimura at eBeam Initiative luncheon at SPIE AL.
Pixel-level dose correction improves the quality of masks written by multi-beam. Blog by D2S CEO Aki Fujimura.
Factors that impact mask lifetime, the future role of actinic inspection, and minimum mask dimensions for high-NA EUV.
Purchases of new photomask equipment are expected to grow over the next three years.
Bala Thumma will be responsible for D2S’ GPU-accelerated pixel-level dose correction (PLDC) technology, which enhances pattern fidelity and accuracy for writing all masks including curvilinear.