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Aki Fujimura, CEO of D2S, Inc. gives an invited talk on curvilinear design at 62DAC during Silicon Integration Initiative, Inc. Open Access Coalition Forum event, Tuesday June 24. Register at: http://si2.regfox.com/si2-dac-registration-page
Evolving lithography demands are challenging mask writing technology, and the shift to curvilinear is happening. Experts at the table include Harry Levinson, principal lithographer at HJL Lithography; Aki Fujimura, CEO of D2S; Ezequiel Russell, senior director of mask technology at Micron; and Christopher Progler, executive vice president and CTO at Photronics.
Experts at the Table: Harry Levinson, principal lithographer at HJL Lithography; Aki Fujimura, CEO of D2S; Ezequiel Russell, senior director of mask technology at Micron; and Christopher Progler, executive vice president and CTO at Photronics
Presented by Aki Fujimura, D2S at PMJ 2025 [April 18, 2025]
D2S CEO Aki Fujimura's second blog in the series explains how improving mask manufacturing is the simplest way to reduce wafer variation.