D2S is the Preferred GPU-Acceleration Partner for Semiconductor Manufacturing
D2S balanced CPU + GPU solutions offer optimal acceleration, price/performance, and 24/7 clean-room-ready reliability.
Gaussian Convolution run on CPU-Only and on CPU+GPU
Data size: ~80 μm by 80μm, 10nm pixels
Hardware Configurations:
CPU-Only 8 cores of 1 Intel Xeon E5-2630 v3 2.6GHz CPU
CPU+GPU 1 core of 1 Intel Xeon E5-2630 v3 2.6GHz CPU
D2S GPU-acceleration solutions are already deployed in production settings by leading semiconductor equipment manufacturers worldwide. Learn more about GPU-acceleration for semiconductor manufacturing and the D2S balanced computing difference. Download the whitepaper, “GPU-Accelerated Computing: Maximizing Performance for Semiconductor Manufacturing”
About D2S | D2S is a supplier of a computational design platform to maximize existing eBeam technology to reduce mask costs for both low- and high-volume applications. D2S TrueMask solutions enable advanced photomask designs at 20-nm-and-below process nodes using complex shapes for superior wafer quality but within practical, cost-effective write-times using existing eBeam mask writing equipment. D2S is the managing sponsor of the eBeam Initiative.
eBeam Initiative | D2S helped drive the creation of the eBeam Initiative, laying the foundation for an industry-wide ecosystem to accelerate the development of eBeam technology. >>visit www.ebeam.org