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®
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®
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®
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Monday, April 24, 2023
Photomask Japan: D
2
S Solutions for Curvy Masks
English
Wednesday, April 12, 2023
Semiconductor Engineering: How Curvilinear Mask Writing Affects Chip Design
English
Tuesday, January 10, 2023
Aki Fujimura of D
2
S explains the advantages of pixel-based computing with GPU acceleration.
English
Tuesday, January 10, 2023
Abhishek Shendre of D
2
S presents the Best Paper awarded at SPIE Photomask 2022.
English
Tuesday, December 13, 2022
Semiconductor Engineering: Increased Photomask Density And Its Impact On EDA
English
Tuesday, November 1, 2022
Aki Fujimura, CEO of D
2
S, meets with Dr. Frank Abboud of Intel to reflect on key moments from his career.
English
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