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Mark LaPedus' lastest update details the results of the eBeam Initiative's latest Luminaries Survey, including insights from Aki Fujimura, D2S CEO.
Highlights from conference include the introduction by D2S of new PLDC techniques, including Dynamic Maximum Dose (DMD).
Results of 15th annual Luminaries survey to be presented at live event held during SPIE Photomask Technology + EUV Lithography Conference
Breaking news from the SPIE Photomask Technology + EUV conference about Large Format Photomasks announced by ASML and TSMC. Aki Fujimura, CEO of D2S, was on hand as President of BACUS to provide this update.
Rising mask costs, tighter high-NA requirements, and new materials challenges are forcing chipmakers to weigh litho choices against volume, design strategy, and total process cost. Experts at the Table, part 3 with Aki Fujimura, CEO at D2S; Glen Scheid, operations manager at Micron; Harry Levinson, principal lithographer at HJL Lithography; Germain Fenger, senior director of product management at Synopsys; and Rich Wise, vice president at Lam Research.

Semiecosystem: Mask Trends

News • June 7, 2026

Mark LaPedus' lastest update includes a link to the video of Mike Hadsell, executive officer and COO of Tekscend, talking about IPOs, EUV and ArF mask equipment investments, AI and curvilinear trends, as well as offering career advice in a wide-ranging interview with Aki Fujimura, CEO of D2S.