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TrueMask® DLK includes rigorous eBeam mask and ArF/EUV lithography simulators from OEM partners for deep learning training
Harold Zable, Chief Technical Wizard at D2S, presented results at the GPU-Technology Conference 2019, in San Jose
Leo Pang explains why GPU-accelerated simulation is so important to deep learning
Ryan Pearman presents a Monte-Carlo approach to curvilinear mask features

Variation Issues Grow Wider And Deeper

Publication • January 24, 2019

New sources, safety-critical applications and tighter tolerances raise new questions both inside and outside the fab.
Experts at the Table, part 3: Where can this technology be applied and what’s ahead.