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SPIE 2019: GPU Accelerated Simulation Enables Deep Learning
Publication • February 26, 2019
Leo Pang explains why GPU-accelerated simulation is so important to deep learning
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SPIE 2019: Enhancing ILT process window using curvilinear mask patterning: dual mask-wafer simulation
Publication • February 26, 2019
Ryan Pearman presents a Monte-Carlo approach to curvilinear mask features
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Variation Issues Grow Wider And Deeper
Publication • January 24, 2019
New sources, safety-critical applications and tighter tolerances raise new questions both inside and outside the fab.
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Semiconductor Engineering: Machine Learning For IC Production
Publication • January 18, 2019
Experts at the Table, part 3: Where can this technology be applied and what’s ahead.
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Semiconductor Engineering: Machine Learning Moves Into Fab And Mask Shop
Publication • November 14, 2018
Experts at the Table, part 2: Where can this technology be applied, why it is taking so long, and what challenges lie ahead.
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Semiconductor Engineering: Will machine learning and AI improve chip manufacturing?
Publication • October 18, 2018
NVIDIA, NuFlare, Mycronic and D
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