News

EDA Cafe: D2S Brings GPU Acceleration to Semiconductor Design and Manufacturing

News • June 25, 2020

A conversation with Bob Smith, Executive Director of the ESD Alliance, and Aki Fujimua, CEO of D2S

EE Times: Digital Twins: Bridging the Data Gap for Deep Learning Success

News • June 1, 2020

Aki Fujimura explains the critical role of digital twins in deep learning

ESD Alliance Announces D2S as a New Member of its Community

News • May 19, 2020

Supplier of GPU-Accelerated Solutions Brings Semiconductor Manufacturing Insights

Mike Schuh Joins D2S Board of Directors

News • April 28, 2020

Semiconductor Engineering: What’s Next With AI In Fabs?

News • April 23, 2020

Experts at the Table, Part 3: Where machine/deep learning is useful and where it’s not.

SPIE Advanced Lithography 2020: TrueMask® ILT MWCO: Full-chip curvilinear ILT in a day and full mask multi-beam and VSB writing in 12 hrs for 193i

Publication • April 3, 2020

Linyong (Leo) Pang, P. Jeffrey Ungar, Ali Bouaricha , Lu Sha, Michael Pomerantsev, Mariusz Niewczas, Kechang Wang, Bo Su, Ryan Pearman, and Aki Fujimura, "TrueMask® ILT MWCO: Full-chip curvilinear ILT in a day and full mask multi-beam and VSB writing in 12 hrs for 193i," Proc. SPIE 11327, Optical Microlithography XXXIII, 113270K (Presented at SPIE Advanced Lithography: February 26, 2020; Published: 31 March 2020); https://doi.org/10.1117/12.2554867.