News

Semiconductor Engineering: EUV, Deep Learning Issues In Mask Making

Publication • July 1, 2019

Experts at the Table: Deep learning is a hot topic, but can the industry use it for mask making? (Part 3)

D2S Introduces GPU-Accelerated Deep Learning Kit Tailored for Photomask and Semiconductor Manufacturing R&D Teams

Press Release • April 15, 2019

TrueMask® DLK includes rigorous eBeam mask and ArF/EUV lithography simulators from OEM partners for deep learning training

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GTC 2019: PLDC on NuFlare MBM-1000: 540 TBytes of Inline MPC in 10 Hours

Publication • March 27, 2019

Harold Zable, Chief Technical Wizard at D2S, presented results at the GPU-Technology Conference 2019, in San Jose

SPIE 2019: GPU Accelerated Simulation Enables Deep Learning

Publication • February 26, 2019

Leo Pang explains why GPU-accelerated simulation is so important to deep learning

SPIE 2019: Enhancing ILT process window using curvilinear mask patterning: dual mask-wafer simulation

Publication • February 26, 2019

Ryan Pearman presents a Monte-Carlo approach to curvilinear mask features

Variation Issues Grow Wider And Deeper

Publication • January 24, 2019

New sources, safety-critical applications and tighter tolerances raise new questions both inside and outside the fab.