News | D2S

Semiconductor Engineering: Large-Format Masks Move From Aspiration To Industry Roadmap

News • October 26, 2026

Expert panel, moderated by D2S CEO Aki Fujimura, sees a compelling productivity case, but the entire photomask ecosystem must be ready together.

Semiecosystem: Survey: Mask Makers Upbeat, New Mask Size Gains Steam

News • September 14, 2026

Mark LaPedus' lastest update details the results of the eBeam Initiative's latest Luminaries Survey, including insights from Aki Fujimura, D2S CEO.

Semiconductor Engineering: News from this week’s SPIE Photomask Technology + Extreme Ultraviolet Lithography conference

News • September 11, 2026

Highlights from conference include the introduction by D2S of new PLDC techniques, including Dynamic Maximum Dose (DMD).

eBeam Initiative Survey of Semiconductor Luminaries Predicts a Bright Outlook for the Photomask Industry

Press Release • September 9, 2026

Results of 15th annual Luminaries survey to be presented at live event held during SPIE Photomask Technology + EUV Lithography Conference

Large Format Photomasks announced by ASML and TSMC. Aki Fujimura, CEO of D2S, was on hand as President of BACUS

News • September 8, 2026

Breaking news from the SPIE Photomask Technology + EUV conference about Large Format Photomasks announced by ASML and TSMC. Aki Fujimura, CEO of D2S, was on hand as President of BACUS to provide this update.

Semiconductor Engineering: Mask Economics Shape High-NA EUV Adoption

News • June 22, 2026

Rising mask costs, tighter high-NA requirements, and new materials challenges are forcing chipmakers to weigh litho choices against volume, design strategy, and total process cost. Experts at the Table, part 3 with Aki Fujimura, CEO at D2S; Glen Scheid, operations manager at Micron; Harry Levinson, principal lithographer at HJL Lithography; Germain Fenger, senior director of product management at Synopsys; and Rich Wise, vice president at Lam Research.