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A conversation with Bob Smith, Executive Director of the ESD Alliance, and Aki Fujimua, CEO of D2S
Aki Fujimura explains the critical role of digital twins in deep learning
Supplier of GPU-Accelerated Solutions Brings Semiconductor Manufacturing Insights
Experts at the Table, Part 3: Where machine/deep learning is useful and where it’s not.
Linyong (Leo) Pang, P. Jeffrey Ungar, Ali Bouaricha , Lu Sha, Michael Pomerantsev, Mariusz Niewczas, Kechang Wang, Bo Su, Ryan Pearman, and Aki Fujimura, "TrueMask® ILT MWCO: Full-chip curvilinear ILT in a day and full mask multi-beam and VSB writing in 12 hrs for 193i," Proc. SPIE 11327, Optical Microlithography XXXIII, 113270K (Presented at SPIE Advanced Lithography: February 26, 2020; Published: 31 March 2020); https://doi.org/10.1117/12.2554867.