News

Semiconductor Engineering: Semiconductor Photomask revenues predicted to increase in 2021

News • November 18, 2021

How the pandemic has impacted the photomask and flat panel display industry

SPIE BACUS Newsletter: Inverse lithography technology: 30 years from concept to practical, full-chip reality

News • November 1, 2021

Journal Review Article by Leo Pang, D2S, and republished in the November 2021 BACUS Newsletter

SPIE BACUS Newsletter: Paving a Curvy Road Ahead

News • November 1, 2021

Editorial by D2S CEO Aki Fujimura

SPIE Photomask Technology 2021: Curvilinear masks: an overview

News • October 1, 2021

Presented by D2S CEO Aki Fujimura at the SPIE Photomask Technology Conference, Sept. 30, 2021

SPIE Photomask Technology 2021: A general formula for deep learning success in semiconductor manufacturing

News • September 30, 2021

Presented by D2S CEO Aki Fujimura at the SPIE Photomask Technology Conference, Sept. 29, 2021

Semiconductor Engineering: Optimizing VSB Shot Count for Curvilinear Masks

News • August 19, 2021

Will variable-shape eBeam (VSB) photomask writers ever be used to write curvilinear shapes?