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Semiconductor Engineering: Perspectives On Why EUV Photomasks Are More Expensive
News • December 20, 2021
Pellicles, inspection, and turnaround time are having an impact on EUV photomask cost.
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Semiconductor Engineering: Business, Technology Challenges Increase For Photomasks
News • December 16, 2021
Experts at the Table (with Aki Fujimura of D
2
S)
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Semiconductor Engineering: Semiconductor Photomask revenues predicted to increase in 2021
News • November 18, 2021
How the pandemic has impacted the photomask and flat panel display industry
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SPIE BACUS Newsletter: Inverse lithography technology: 30 years from concept to practical, full-chip reality
News • November 1, 2021
Journal Review Article by Leo Pang, D
2
S, and republished in the November 2021 BACUS Newsletter
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SPIE BACUS Newsletter: Paving a Curvy Road Ahead
News • November 1, 2021
Editorial by D
2
S CEO Aki Fujimura
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SPIE Photomask Technology 2021: Curvilinear masks: an overview
News • October 1, 2021
Presented by D
2
S CEO Aki Fujimura at the SPIE Photomask Technology Conference, Sept. 30, 2021
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