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Experts at the Table (with Aki Fujimura of D2S) - Part 2

Full Chip Curvilinear ILT with both Multi-Beam and VSB Mask Writers That Improves Wafer Process Windows by 2X (Special Talk)

Experts at the Table (with Aki Fujimura of D2S) - Part 1

Linyong (Leo) Pang, Ezequiel V Russell, Bill Baggenstoss, Yang Lu, Michael Lee, Jennefir Ping Digaum, Ming-Chuan Yang, Ryan Pearman, P. Jeffrey Ungar, Lu Sha, Ali Bouaricha, Michael Pomerantsev, Mariusz Niewczas, Kechang Wang, Bo Su, Michael Meyer, Aki Fujimura, "Enabling faster VSB writing of 193i curvilinear ILT masks that improve wafer process windows for advanced memory applications," Proc. SPIE 11518, Photomask Technology 2020, 115180W (7 October 2020); https://doi.org/10.1117/12.2579729

Semiconductor development has been a longtime user of digital twins, and shift left is resulting in a rethinking of the models being generated and where they may have value (with Aki Fujimura from D2S).