D2S CEO Aki Fujimura speaks about the past, present and future of the eBeam Initiative
D2S CEO reviews how far the mask industry has come in the last 15 years at eBeam Initiative lunch at SPIE-AL 2024

SPIE: Throwing Lithography a Curve

News • February 20, 2024

Mask wafer co-optimization makes it practical to create curved shapes using variable shaped beam mask writers
SEMI's Bob Smith interviews D2S, Inc. CEO Aki Fujimura about the prospects for curvilinear design.
At the SPIE Photomask Technology Conference in October, Aki Fujimura, CEO of D2S, Inc., moderated a panel discussion of the factors driving 193i lithography down to smaller nodes. He was joined by Chris Progler, CTO of Photronics; Glen Scheid, Operations Manager at the Micron Mask Technology Center; and Harry Levinson, Principal Lithographer at HJL Lithography.
Using digital twins to bridge the data gap that keeps deep learning prototypes from moving to production.