Will variable-shape eBeam (VSB) photomask writers ever be used to write curvilinear shapes?
New tools not only need to check for errors but repair them as well.
What trade-offs are involved in defining a new curvilinear data format to reduce file sizes?
Using GPUs as an enabler for curvilinear inverse lithography technology, and other ways to produce mask shapes in acceptable runtimes.
Article from Ajay Baranwal of the CDLe, Noriaki Nakayamada of NuFlare, Mikael Wahlsten of Micronic, and Aki Fujimura of D2S
Some gaps still need to be addressed, but experts are optimistic.