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SPIE: Throwing Lithography a Curve

News • February 20, 2024

Mask wafer co-optimization makes it practical to create curved shapes using variable shaped beam mask writers
SEMI's Bob Smith interviews D2S, Inc. CEO Aki Fujimura about the prospects for curvilinear design.
At the SPIE Photomask Technology Conference in October, Aki Fujimura, CEO of D2S, Inc., moderated a panel discussion of the factors driving 193i lithography down to smaller nodes. He was joined by Chris Progler, CTO of Photronics; Glen Scheid, Operations Manager at the Micron Mask Technology Center; and Harry Levinson, Principal Lithographer at HJL Lithography.
Using digital twins to bridge the data gap that keeps deep learning prototypes from moving to production.
The expert panel at DAC 2023 tell us what they think is needed to make curvy design a reality. Automatic curvy routing and parasitic extraction will be essential, while DRC may become easier.
Curvilinear technology could boost yield and improve scalability, but it requires full industry support and a lot of work. Article includes comments from D2S CEO Aki Fujimura.