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Semiconductor Engineering: Industry Luminaries Highlight Opportunities For Advancing The Non-EUV Leading Edge

News • December 19, 2023

At the SPIE Photomask Technology Conference in October, Aki Fujimura, CEO of D2S, Inc., moderated a panel discussion of the factors driving 193i lithography down to smaller nodes. He was joined by Chris Progler, CTO of Photronics; Glen Scheid, Operations Manager at the Micron Mask Technology Center; and Harry Levinson, Principal Lithographer at HJL Lithography.
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Semiconductor Engineering: Center For Deep Learning In Electronics Manufacturing: Bringing Deep Learning To Production For Photomask Manufacturing

News • November 16, 2023

Using digital twins to bridge the data gap that keeps deep learning prototypes from moving to production.
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Semiconductor Engineering: Why Curvy Design Now? Less Change Than You Think And Manufacturable Today

News • October 19, 2023

The expert panel at DAC 2023 tell us what they think is needed to make curvy design a reality. Automatic curvy routing and parasitic extraction will be essential, while DRC may become easier.
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Semiconductor Engineering: Big Changes Ahead For Photomask Technology

News • October 19, 2023

Curvilinear technology could boost yield and improve scalability, but it requires full industry support and a lot of work. Article includes comments from D2S CEO Aki Fujimura.
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D2S CEO Aki Fujimura Named a SPIE Fellow

Press Release • September 26, 2023

Aki Fujimura recognized by SPIE for his technical leadership in applying GPU acceleration to semiconductor manufacturing software, significant service to SPIE, and industry collaboration through the eBeam Initiative
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Semiconductor Engineering: When And Where To Implement AI/ML In Fabs

News • September 21, 2023

Smarter tools can improve process control, identify the causes of excursions, and accelerate recipe development.
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