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SPIE: Throwing Lithography a Curve

News • February 20, 2024

Mask wafer co-optimization makes it practical to create curved shapes using variable shaped beam mask writers
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SEMI: D2S CEO Aki Fujimura: Curvy Design’s Time Has Come

News • February 5, 2024

SEMI's Bob Smith interviews D2S, Inc. CEO Aki Fujimura about the prospects for curvilinear design.
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Semiconductor Engineering: Industry Luminaries Highlight Opportunities For Advancing The Non-EUV Leading Edge

News • December 19, 2023

At the SPIE Photomask Technology Conference in October, Aki Fujimura, CEO of D2S, Inc., moderated a panel discussion of the factors driving 193i lithography down to smaller nodes. He was joined by Chris Progler, CTO of Photronics; Glen Scheid, Operations Manager at the Micron Mask Technology Center; and Harry Levinson, Principal Lithographer at HJL Lithography.
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Semiconductor Engineering: Center For Deep Learning In Electronics Manufacturing: Bringing Deep Learning To Production For Photomask Manufacturing

News • November 16, 2023

Using digital twins to bridge the data gap that keeps deep learning prototypes from moving to production.
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Semiconductor Engineering: Why Curvy Design Now? Less Change Than You Think And Manufacturable Today

News • October 19, 2023

The expert panel at DAC 2023 tell us what they think is needed to make curvy design a reality. Automatic curvy routing and parasitic extraction will be essential, while DRC may become easier.
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Semiconductor Engineering: Big Changes Ahead For Photomask Technology

News • October 19, 2023

Curvilinear technology could boost yield and improve scalability, but it requires full industry support and a lot of work. Article includes comments from D2S CEO Aki Fujimura.
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