News | D2S

Semiconductor Engineering: Single Vs. Multi-Patterning Advancements For EUV

News • June 20, 2024

EUV patterning has come a long way in the past five years, but old challenges resurface with high-NA EUV. Dr. Leo Pang of D2S adds his perspective on advanced lithography and curvilinear masks for EUV.

Semiconductor Engineering: Opportunities Grow For GPU Acceleration

News • June 5, 2024

Experts at the Table: Semiconductor Engineering sat down to discuss the impact of GPU acceleration on mask design and production and other process technologies, with Aki Fujimura, CEO of D2S; Youping Zhang, head of ASML Brion; Yalin Xiong, senior vice president and general manager of the BBP and reticle products division at KLA; and Kostas Adam, vice president of engineering at Synopsys.

Semiconductor Engineering: Navigating The GPU Revolution

News • April 24, 2024

Potential cost and time benefits are driving GPU adoption, despite challenges. Experts at the table discussion includes D2S CEO Aki Fujimura; Youping Zhang, head of ASML Brion; Yalin Xiong, senior vice president and general manager of the BBP and reticle products division at KLA; and Kostas Adam, vice president of engineering at Synopsys.