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Experts at the Table, Part 2: ML is playing a bigger role in metrology and lithography, but it can’t replace physics-based models.
Experts at the Table: It’s not as accurate as simulation, but it’s a lot faster.
Presented at SPIE Advanced Lithography Conference by Leo Pang of D2S
D2S TrueMask® WPA enables fast and accurate simulation of complex and curvilinear mask shapes for cost-effective CD metrology

EE Journal: Full-Chip ILT in a Day

News • December 3, 2019

D2S Brings a Custom Computing Platform to the Party
Experts at the Table: AI, EUV pellicles and inverse lithography are hot topics in mask making today