News | Design 2 Silicon

Experts at the Table, Part 2: ML is playing a bigger role in metrology and lithography, but it can’t replace physics-based models.

Experts at the Table: It’s not as accurate as simulation, but it’s a lot faster.

Presented at SPIE Advanced Lithography Conference by Leo Pang of D2S

D2S TrueMask® WPA enables fast and accurate simulation of complex and curvilinear mask shapes for cost-effective CD metrology

D2S Brings a Custom Computing Platform to the Party

Experts at the Table: AI, EUV pellicles and inverse lithography are hot topics in mask making today