The mask industry has seen many significant changes in recent years – including adoption of inverse-lithography technologies (ILT), multi-beam mask writing, and extreme ultra-violet (EUV) lithography – that require extensive collaboration and education throughout the ecosystem. The eBeam Initiative provides a forum for educational and promotional activities regarding new semiconductor manufacturing approaches based on electron beam (eBeam) technologies.
BACUS is an international professional organization of mask makers, materials and equipment suppliers, and mask users. It is a Technical Group of SPIE, the International Society for Optics and Photonics. BACUS works to promote, to educate, and to strengthen the photomask industry and ecosystem with major focus on a sustainable annual SPIE Photomask Technology Conference, a part of the Photomask and EUV Lithography symposium, annually held in the fall, usually in Monterey, California.
The Center for Deep Learning in Electronics Manufacturing (CDLe) was a five-year (2018-2023) alliance between D2S, Mycronic and NuFlare Technology – industry leaders who recognized deep learning’s problem-solving potential for electronics manufacturing. CDLe successfully completed over 30 production DL projects for electronic manufacturing by using digital twin technology to bridge the data gap.
The ESD Alliance, a SEMI Technology Community, is an international association of companies providing goods and services throughout the semiconductor design ecosystem. It provides a forum to address technical, marketing, economic and legislative issues affecting the entire industry. It acts as the central voice to communicate and promote the value of the semiconductor design industry as a vital component of the global electronics industry. D2S CEO Aki Fujimura is a member of the ESD Alliance Governing Council.
