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eBeam Initiative

Many changes are coming to the mask industry – including greater use of inverse-lithography technologies (ILT), the advent of multi-beam mask writing, and the anticipated introduction of extreme ultra-violet (EUV) lithography – that will required more collaboration and education throughout the ecosystem. The eBeam Initiative provides a forum for educational and promotional activities regarding new semiconductor manufacturing approaches based on electron beam (eBeam) technologies.

An eBeam event sponsored by D2S
An eBeam event sponsored by D2S

Center for Deep Learning in Electronics Manufacturing (CDLe)

GPU-accelerated computing power has fueled the recent growth and wide application of deep learning. Together, NuFlare and Mycronic represent a very important part of the electronics manufacturing supply chain. D2S looks forward to working with these industry leaders in the formation of the CDLe to advance the use of deep learning technologies for the electronics manufacturing industry.

Noriaki Nakayamada of NuFlare, Mikael Wahlsten of Mycronic, and Aki Fujimura of D2S at the opening of the CDLe
Noriaki Nakayamada of NuFlare, Mikael Wahlsten of Mycronic, and Aki Fujimura of D2S at the opening of the CDLe