Many changes are coming to the mask industry – including greater use of inverse-lithography technologies (ILT), the advent of multi-beam mask writing, and the anticipated introduction of extreme ultra-violet (EUV) lithography – that will required more collaboration and education throughout the ecosystem. The eBeam Initiative provides a forum for educational and promotional activities regarding new semiconductor manufacturing approaches based on electron beam (eBeam) technologies.
GPU-accelerated computing power has fueled the recent growth and wide application of deep learning. Together, NuFlare and Mycronic represent a very important part of the electronics manufacturing supply chain. D2S looks forward to working with these industry leaders in the formation of the CDLe to advance the use of deep learning technologies for the electronics manufacturing industry.