Many changes are coming to the mask industry – including greater use of inverse-lithography technologies (ILT), the advent of multi-beam mask writing, and the anticipated introduction of extreme ultra-violet (EUV) lithography – that will required more collaboration and education throughout the ecosystem. The eBeam Initiative provides a forum for educational and promotional activities regarding new semiconductor manufacturing approaches based on electron beam (eBeam) technologies.

An eBeam event sponsored by D2S
An eBeam event sponsored by D2S

Read more about the eBeam Initiative

The eBeam initiative publishes video, articles, and surveys about the semiconductor engineering industry.

Upcoming Events

PMJ 2018

Thursday, April 19, 2018

eBeam Initiative survey results to be presented by Aki Fujimura, D2S