As the size of mask features moves into the sub‐80nm realm, mask accuracy has become an increasingly difficult problem with increasing impact on wafer yield. D2S TrueMask® DS GPU-accelerated workstation is the first and only mask‐wafer double simulation platform for R&D exploration, bit‐cell design, hot‐spot analysis, and mask‐defect categorization that comprehends overlapping shots and dose modulation.
White areas show the eBeam simulation overlapping shots highlighted with blue outline.
Shows slope of eBeam simulation intensity dope map at threshold point, for analysis.
Green = good slope (steep)
Yellow = ok
Red = bad slope (shallow)
Dark outline shows the simulation of mask-process effects that form the input to lithography simulation.
Lithography simulation, with light intensity plot.
Lithography simulation without light intensity plot
Purple outline shape is input CAD data.