The increasing complexity in mask designs – in particular the sharp increase in the need for complex sub-resolution assist features (SRAFs) at 28-nm-and-below process nodes – has given rise to new challenges with mask write times (and therefore, cost) and mask quality.
D2S TrueMask® MDP is the first and only GPU-accelerated, model-based mask data preparation (MB-MDP) solution for complex masks. It offers fully automated, full-chip mask data preparation for any complex mask – including Manhattanized, curvilinear and ideal inverse lithography technology (ILT) mask shapes – within practical, cost-effective write times. TrueMask® MDP reduces eBeam shot count to cut mask write times by 20-30% or more, while improving the quality of the eventual wafers through built-in mask process correction (MPC).
“D2S TrueMask® MDP is the first and the most promising product we’ve collaborated on that uses the new model-based mask data preparation approach to enable both accuracy and reasonable mask write times.”
Dr. Naoya Hayashi, DNP