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Monday, October 19, 2020

Leo Pang, chief product officer of D2S, offers his impressions of the SPIE Photomask Technology + EUV Lithography Conference in Chinese

Tuesday, September 22, 2020

Aki Fujimura, CEO of D2S, moderates the eBeam Initiative panel on mask survey results at SPIE Photomask Technology Conference 2020

Tuesday, June 2, 2020

Leo Pang, Chief Product Officer of D2S, reviews a unique GPU-accelerated approach to curvilinear inverse lithography technology (ILT) and introduces mask-wafer co-optimization (MWCO).

Tuesday, March 17, 2020

Aki Fujimura of D2S with SPIE AL 2020 highlights, including EUV, Deep Learning, curvilinear masks

Tuesday, March 17, 2020

Leo Pang of D2S also recaps SPIE-AL 2020 developments

Tuesday, October 15, 2019

Dr. Leo Pang of D2S explains the importance of ILT digital twins in today’s growing curvilinear ILT world