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Tuesday, March 17, 2020

Leo Pang of D2S also recaps SPIE-AL 2020 developments

Tuesday, October 15, 2019

Dr. Leo Pang of D2S explains the importance of ILT digital twins in today’s growing curvilinear ILT world

Tuesday, October 15, 2019

Aki Fujimura, CEO of D2S, provides key takeaways from the recent Photomask Technology Conference

Wednesday, June 5, 2019

eBeam Initiative: In this Tech Talk, presented at Photomask Japan, D2S modeling expert Ryan Pearman examines the effects of curvilinear mask data on wafer variability and explains why curvilinear features are needed for EUV lithography.

Wednesday, June 5, 2019

eBeam Initiative: Shot Talk Aki Fujimura and Leo Pang of D2S recap the launch of the D2S TrueMask® DLK deep learning kit and “hot topics” from the Photomask Japan Conference.

Wednesday, March 27, 2019

Leo Pang, chief product officer of D2S, describes how GPU-accelerated simulation can enable deep learning for both mask and wafer manufacturing