D2S, an emerging design and software company, today announced that Aki Fujimura, Chairman and CEO of the company, will provide a tutorial at the International Conference on Computer‐Aided Design (ICCAD) on Monday, November 2, 2009 at the DoubleTree Hotel in San Jose, Calif. The talk will be held within the design for manufacturing (DFM) tutorial from 11:00 a.m. to 12:30 p.m. and discuss e‐beam direct write (EbDW) and design for e‐beam (DFEB).
As the industry moves to smaller geometries, mask costs become an even bigger challenge for IC manufacturers—making low‐volume production of custom ICs economically infeasible. D2S’s tutorial will provide the industry with alternative methods for low‐volume, high‐value designs. It will accomplish this by delving into the various maskless EbDW technologies in production today, as well as providing you with a glimpse into the roadmap for the future.
D2S’ tutorial will be made available online after November 2 at www.direct2silicon.com.
About D2S
D2S is empowering an era of new business opportunities for electronic products by making low‐volume silicon production cost effective at the 65‐nanometer node and below. D2S’ advanced design for‐e‐ beam (DFEB) design and software capabilities maximize existing e‐beam technology to virtually eliminate the costs of masks and can speed time to market by shortening the design‐to‐lithography process flow. Headquartered in San Jose, Calif., the company was founded in 2007. For more information, see: www.direct2silicon.com.