SPIE Photomask Technology 2019: Full-Chip Curvilinear ILT in a Day

Linyong Pang, Ezequiel Vidal Russell, Bill Baggenstoss, Michael Lee, Jennefir Digaum, Ming-Chuan Yang, P. Jeffrey Ungar, Ali Bouaricha; Kechang Wang, Bo Su, Ryan Pearman, Aki Fujimura, “Study of mask and wafer co-design that utilizes a new extreme SIMD approach to computing in memory manufacturing: full-chip curvilinear ILT in a day,” Proc. SPIE 11148, Photomask Technology 2019 (October 3, 2019). DOI: https://doi.org/10.1117/12.2534629