Increased complexity introduced by the ongoing march of Moore’s Law has increased the need for mask simulation. But any simulation is only as accurate as the model used. Many changes are coming to the mask industry – including greater use of inverse-lithography technologies (ILT), the advent of multi-beam mask writing, and the anticipated introduction of extreme ultra-violet (EUV) lithography – that will required more detailed, more accurate models. D2S TrueModel® is a physical model that provides D2S mask-simulation products with the accuracy required for today’s leading-edge nodes. GPU acceleration opens the door for simulation-based correction of a multitude of complex mask effects based on physical models, affording practical simulation runtimes for these more complex models.
