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SPIE BACUS Newsletter: Inverse lithography technology: 30 years from concept to practical, full-chip reality

News • November 1, 2021

Journal Review Article by Leo Pang, D2S, and republished in the November 2021 BACUS Newsletter
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SPIE BACUS Newsletter: Paving a Curvy Road Ahead

News • November 1, 2021

Editorial by D2S CEO Aki Fujimura
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SPIE Photomask Technology 2021: Curvilinear masks: an overview

News • October 1, 2021

Presented by D2S CEO Aki Fujimura at the SPIE Photomask Technology Conference, Sept. 30, 2021
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SPIE Photomask Technology 2021: A general formula for deep learning success in semiconductor manufacturing

News • September 30, 2021

Presented by D2S CEO Aki Fujimura at the SPIE Photomask Technology Conference, Sept. 29, 2021
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Semiconductor Engineering: Optimizing VSB Shot Count for Curvilinear Masks

News • August 19, 2021

Will variable-shape eBeam (VSB) photomask writers ever be used to write curvilinear shapes?
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Semiconductor Engineering: What About Mask Rule Checking For Curvilinear Photomasks?

News • July 22, 2021

New tools not only need to check for errors but repair them as well.
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