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Uniformity
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The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
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Page 10
Silicon Semiconductor: eBeam Initiative: A voice for the photomask industry during rapid evolution
News • June 21, 2023
As the group approaches its 15th anniversary, the shift to curvilinear masks tops the agenda. Includes D
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S, Inc. CEO Aki Fujimura.
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EE News Europe: CEO interview: AI creates step change for lithography. Aki Fujimura, D
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S
News • June 20, 2023
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Semiconductor Engineering: 193i Lithography Takes Center Stage…Again
News • June 16, 2023
High-NA EUV is still in the works, but more chips/chiplets will be developed using older, less-expensive equipment.
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Semiconductor Digest: D
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S Receives Milestone Order for 50th GPU-Based Computational Design Platform for Optimizing Semiconductor Manufacturing
News • June 13, 2023
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D
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S Recevies Milestone Order for 50th GPU-Based Computational Design Platform for Optimizing Semiconductor Manufacturing
Press Release • June 13, 2023
GPU Acceleration Key to Enabling Curvilinear Photomask Features for the Widest Semiconductor Process Windows
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Semiconductor Engineering: Reflections On Photomask Japan 2023: Embracing The Era Of Curvilinear Masks
News • May 18, 2023
The entire mask industry needs to prepare for the new ecosystem surrounding curvilinear data handling and metrology
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