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Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
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PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
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About D
2
S
Timeline of D
2
S Technology Highlights
Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
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Page 11
D
2
S Recevies Milestone Order for 50th GPU-Based Computational Design Platform for Optimizing Semiconductor Manufacturing
Press Release • June 13, 2023
GPU Acceleration Key to Enabling Curvilinear Photomask Features for the Widest Semiconductor Process Windows
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Semiconductor Engineering: Reflections On Photomask Japan 2023: Embracing The Era Of Curvilinear Masks
News • May 18, 2023
The entire mask industry needs to prepare for the new ecosystem surrounding curvilinear data handling and metrology
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EE News Europe: Nvidia boss pitches generative AI for chip manufacturing
News • May 16, 2023
Jensen Huang, CEO of NVIDIA, speaking at imec’s ITF World 2023 semiconductor conference, pointed to D
2
S as an example of the application of GPU computing in semiconductor manufacturing.
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NVIDIA Blog: Chip Manufacturing ‘Ideal Application’ for AI, NVIDIA CEO Says
News • May 16, 2023
D
2
S cited as part of a movement to include GPU-based computing and AI in semiconductor manufacturing applications.
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ESD Alliance Elects 10-Member Governing Council
News • May 15, 2023
Aki Fujimura, CEO of D
2
S, re-elected as part of ESD Governing Council for 2023-2025
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Engineering and Technology: Shapes of things to come: Nvidia’s foray into litho bolsters curvy chip designs
News • April 4, 2023
Chips with straight lines? Think again. The future involves a lot more curves.
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