News

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Semiconductor Engineering: Developing A New Curvilinear Data Format

News • June 17, 2021

What trade-offs are involved in defining a new curvilinear data format to reduce file sizes?

Semiconductor Engineering: How Will The Adoption Of Curvilinear Masks Affect Turnaround Time?

News • June 1, 2021

Using GPUs as an enabler for curvilinear inverse lithography technology, and other ways to produce mask shapes in acceptable runtimes.

Semiconductor Digest: Automating Mask SEM Analysis Using Digital Twins

News • May 26, 2021

Article from Ajay Baranwal of the CDLe, Noriaki Nakayamada of NuFlare, Mikael Wahlsten of Micronic, and Aki Fujimura of D2S

Semiconductor Engineering: Is The Photomask Ecosystem Ready For Curvilinear ILT?

News • May 18, 2021

Some gaps still need to be addressed, but experts are optimistic.

SEMI: Throwing a Curveball: Will Future ICs Be Designed Using Curvilinear Shapes Instead of Rectangles?

News • May 17, 2021

Robert (Bob) Smith, executive director of the ESD Alliance, a SEMI Technology Community, in conversation with D2S CEO Aki Fujimura

Semiconductor Engineering: What’s Next In Fab Tool Technologies?

News • May 13, 2021

Experts at the Table (with Aki Fujimura of D2S) - Part 3