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EETimes: Useful Waste: Rethinking Computing in the GPU Era

News • May 6, 2021

D2S CEO Aki Fujimura offers his views on the impact of GPU-based computing
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Semiconductor Engineering: How Extensively Will Curvilinear ILT Be Used For EUV Photomasks?

News • April 29, 2021

Looking beyond hotspots to more extensive use of curvilinear shapes.
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Semiconductor Digest: Applications, Challenges For Using AI In Fabs

News • April 15, 2021

D2S CEO Aki Fujimura offers his views on Deep Learning and Digital Twins along with other industry experts
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Semiconductor Engineering: The Quest For Curvilinear Photomasks

News • April 15, 2021

D2S CPO Leo Pang and CEO Aki Fujimura explain why curvilinear masks matter
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Semiconductor Engineering: How Do Multi-Beam Mask Writers Enable Curvilinear Shapes On Photomasks?

News • April 15, 2021

Why multi-beam mask write time becomes constant no matter how complex the mask shapes.
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Semiconductor Engineering: Bending The Rules With Curvilinear Technology

News • April 5, 2021

TSMC’s Danping Peng looks at the historical hurdles for this technology.
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