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Page 13
SPIE Photomask Technology 2021: Curvilinear masks: an overview
News • October 1, 2021
Presented by D
2
S CEO Aki Fujimura at the SPIE Photomask Technology Conference, Sept. 30, 2021
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SPIE Photomask Technology 2021: A general formula for deep learning success in semiconductor manufacturing
News • September 30, 2021
Presented by D
2
S CEO Aki Fujimura at the SPIE Photomask Technology Conference, Sept. 29, 2021
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Semiconductor Engineering: Optimizing VSB Shot Count for Curvilinear Masks
News • August 19, 2021
Will variable-shape eBeam (VSB) photomask writers ever be used to write curvilinear shapes?
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Semiconductor Engineering: What About Mask Rule Checking For Curvilinear Photomasks?
News • July 22, 2021
New tools not only need to check for errors but repair them as well.
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Semiconductor Engineering: Developing A New Curvilinear Data Format
News • June 17, 2021
What trade-offs are involved in defining a new curvilinear data format to reduce file sizes?
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Semiconductor Engineering: How Will The Adoption Of Curvilinear Masks Affect Turnaround Time?
News • June 1, 2021
Using GPUs as an enabler for curvilinear inverse lithography technology, and other ways to produce mask shapes in acceptable runtimes.
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