Products & Technologies
About D
2
S
Curvilinear
News
Community
Videos
Join D
2
S
Contact Us
Menu
News
Technologies
GPU Acceleration
Deep Learning
MB-MDP & MPC
Curvilinear
Products
CDP
TrueMask
®
ILT
TrueMask
®
MDP
TrueMask
®
DS
TrueMask
®
DLK
TrueModel
®
TrueMask
®
WPA
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Technology
GPU Acceleration
Deep Learning
MB-MDP & MPC
Curvilinear
Products
CDP
TrueMask
®
ILT
TrueMask
®
MDP
TrueMask
®
DS
TrueMask
®
DLK
TrueModel
®
TrueMask
®
WPA
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Information
News
Community
Videos
Join D
2
S
Contact Us
Menu
Page 15
SEMI: Throwing a Curveball: Will Future ICs Be Designed Using Curvilinear Shapes Instead of Rectangles?
News • May 17, 2021
Robert (Bob) Smith, executive director of the ESD Alliance, a SEMI Technology Community, in conversation with D
2
S CEO Aki Fujimura
Read More
Semiconductor Engineering: What’s Next In Fab Tool Technologies?
News • May 13, 2021
Experts at the Table (with Aki Fujimura of D
2
S) - Part 3
Read More
EETimes: Useful Waste: Rethinking Computing in the GPU Era
News • May 6, 2021
D
2
S CEO Aki Fujimura offers his views on the impact of GPU-based computing
Read More
Semiconductor Engineering: How Extensively Will Curvilinear ILT Be Used For EUV Photomasks?
News • April 29, 2021
Looking beyond hotspots to more extensive use of curvilinear shapes.
Read More
Semiconductor Digest: Applications, Challenges For Using AI In Fabs
News • April 15, 2021
D
2
S CEO Aki Fujimura offers his views on Deep Learning and Digital Twins along with other industry experts
Read More
Semiconductor Engineering: The Quest For Curvilinear Photomasks
News • April 15, 2021
D
2
S CPO Leo Pang and CEO Aki Fujimura explain why curvilinear masks matter
Read More
Older Posts
Newer Posts
