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Page 15
Semiconductor Digest: Automating Mask SEM Analysis Using Digital Twins
News • May 26, 2021
Article from Ajay Baranwal of the CDLe, Noriaki Nakayamada of NuFlare, Mikael Wahlsten of Micronic, and Aki Fujimura of D
2
S
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Semiconductor Engineering: Is The Photomask Ecosystem Ready For Curvilinear ILT?
News • May 18, 2021
Some gaps still need to be addressed, but experts are optimistic.
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SEMI: Throwing a Curveball: Will Future ICs Be Designed Using Curvilinear Shapes Instead of Rectangles?
News • May 17, 2021
Robert (Bob) Smith, executive director of the ESD Alliance, a SEMI Technology Community, in conversation with D
2
S CEO Aki Fujimura
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Semiconductor Engineering: What’s Next In Fab Tool Technologies?
News • May 13, 2021
Experts at the Table (with Aki Fujimura of D
2
S) - Part 3
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EETimes: Useful Waste: Rethinking Computing in the GPU Era
News • May 6, 2021
D
2
S CEO Aki Fujimura offers his views on the impact of GPU-based computing
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Semiconductor Engineering: How Extensively Will Curvilinear ILT Be Used For EUV Photomasks?
News • April 29, 2021
Looking beyond hotspots to more extensive use of curvilinear shapes.
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