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Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
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PLDC
MPC for uniformity and linearity
TrueMask
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ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
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About D
2
S
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2
S Technology Highlights
Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
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Page 15
Semiconductor Engineering: Luminaries See Growth Opportunities For Photomask Writers
News • January 20, 2022
Sales of new photomask writers are expected to increase across all segments
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Semiconductor Engineering: Perspectives On Why EUV Photomasks Are More Expensive
News • December 20, 2021
Pellicles, inspection, and turnaround time are having an impact on EUV photomask cost.
Read More
Semiconductor Engineering: Business, Technology Challenges Increase For Photomasks
News • December 16, 2021
Experts at the Table (with Aki Fujimura of D
2
S)
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Semiconductor Engineering: Semiconductor Photomask revenues predicted to increase in 2021
News • November 18, 2021
How the pandemic has impacted the photomask and flat panel display industry
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SPIE BACUS Newsletter: Inverse lithography technology: 30 years from concept to practical, full-chip reality
News • November 1, 2021
Journal Review Article by Leo Pang, D
2
S, and republished in the November 2021 BACUS Newsletter
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SPIE BACUS Newsletter: Paving a Curvy Road Ahead
News • November 1, 2021
Editorial by D
2
S CEO Aki Fujimura
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