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Page 16
Semiconductor Engineering: Deep Learning (DL) Applications in Photomask to Wafer Semiconductor Manufacturing
News • March 17, 2021
D
2
S and fellow eBeam Initiative member contribute to this DL survey
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Semiconductor Engineering: The Benefits Of Curvilinear Shapes On Photomasks
News • March 15, 2021
Using curvilinear shapes to increase process windows for advanced memory.
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SEMI Panel Touts Innovation from Electronic System Design Ecosystem
News • March 12, 2021
D
2
S CEO Aki Fujimura participates in “Innovating for the Future! Electronic System Design –– Where Microelectronics Begins” panel
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Semiconductor Engineering: Changing The Rules For Chip Scaling
News • March 10, 2021
D
2
S CEO Aki Fujimura and Ed Sperling discuss the potential impact of curvilinear photomask capabilities on transistor density
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Semiconductor Engineering: Breaking The 2nm Barrier
News • February 18, 2021
D
2
S CEO Aki Fujimura among the industry experts to offer views on what will be important to make 2nm and beyond successful
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Panel: Innovating for the Future! Electronic System Design – Where Microelectronics Begins
News • February 2, 2021
Aki Fujimura, CEO of D
2
S, participates in the panel February 18, 2021, hosted by SEMI ESDA as part of the new Technologies Unite Global Summit
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