News

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Semiconductor Engineering: What Machine Learning Can Do In Fabs

News • March 25, 2020

Experts at the Table: It’s not as accurate as simulation, but it’s a lot faster.

TrueMask® ILT MWCO: Full-Chip Curvilinear ILT in a Day & Full Mask Multi-Beam and VSB Writing in 12 hours for 193i

Publication • March 4, 2020

Presented at SPIE Advanced Lithography Conference by Leo Pang of D2S

D2S Extends GPU-Accelerated Wafer-Plane Analysis to EUV Photomasks

Press Release • February 25, 2020

D2S TrueMask® WPA enables fast and accurate simulation of complex and curvilinear mask shapes for cost-effective CD metrology

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EE Journal: Full-Chip ILT in a Day

News • December 3, 2019

D2S Brings a Custom Computing Platform to the Party

Semiconductor Engineering: Making And Protecting Advanced Masks

News • November 28, 2019

Experts at the Table: AI, EUV pellicles and inverse lithography are hot topics in mask making today

Semiconductor Engineering: Using Digital Twins And DL In Lithography

News • November 22, 2019

How to speed up manufacturing with inverse lithography technology with complex curvilinear data, with Leo Pang of D2S