News

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VLSI Research: 2019 Semiconductor Mask Maker's Survey

Publication • November 1, 2019

Dan Hutcheson's conversation with Aki Fujimura of the eBeam Initiative

Semiconductor Engineering: Curvilinear Full-Chip ILT

News • October 18, 2019

Why Inverse Lithography Technology has Finally Come of Age

IEEE Spectrum: Custom Computer Makes Inverse Lithography Technology Practical for First Time

Publication • September 26, 2019

D2S has built a GPU-based supercomputer that cracks the last problem in speeding up optical lithography

Semiconductor Digest: D2S Enables “Stitchless” Full-Chip Inverse Lithography Technology in a Single Day for The Multi-Beam Era

News • September 18, 2019

D2S Introduces TrueMask® ILT

Semiconductor Engineering: Manufacturing Bits

Publication • September 17, 2019

Full-Chip Inverse Lithography

D2S Enables “Stitchless” Full-Chip Inverse Lithography Technology in a Single Day for the Multi-Beam Era

Press Release • September 16, 2019

TrueMask®® ILT employs a unique GPU-accelerated approach that emulates a single, giant GPU/CPU pair that can compute an entire full-chip ILT solution at once

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