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Page 26
Yoshio Tanaka Joins D
2
S, Inc. as Vice President to Drive New Business Development in Japan
Press Release • September 8, 2014
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D
2
S Expands GPU Acceleration Capability for Advanced Semiconductor Lithography and Photomask Manufacturing with Acquisition of Gauda
Press Release • June 3, 2014
Latest-generation Computational Design Platform more than doubles processing speed and enables the first inline dose correction in multi-beam mask writers.
English
日本語
Lithography Luminary Dr. Leo Pang Joins D
2
S as Chief Product Officer
Press Release • May 12, 2014
English
日本語
GPU Based Lithography Simulation and OPC
Publication • February 1, 2014
University of Massachusetts Amherst Masters Thesis by Lokesh Subramay
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D
2
S and NuFlare Extend Partnership to Accelerate eBeam Computational Design Platform Deployment for Advanced Photomasks
Press Release • September 9, 2013
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日本語
Ecosystem Quote Sheet for TrueMask
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MDP — the First and Only Model‐Based Mask Data Preparation Solution to Process Full‐Chip Design Data for Production Applications
News • September 11, 2012
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