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Page 27
Summer 2017 Edition of Shot Talk Released
News • June 26, 2017
Aki Fujimura and Leo Pang highlight the company’s latest developments as it celebrates its 10th anniversary.
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PMJ 2017: Model-Based MPC Enables Curvilinear ILT Using Either VSB or Multi-Beam Mask Writers presented by Leo Pang
Publication • April 5, 2017
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PMJ 2017: EUV Modeling in the Multi-Beam mask making Era presented by Ryan Pearman
Publication • April 5, 2017
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PMJ 2017: Simulation-Based MDP Verification for Leading-Edge Masks presented by Bo Su
Publication • April 5, 2017
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Experts at the Table Part 2 – Where EUV fits, what problems still remain, and what are the alternatives by Mark LaPedus
Publication • April 5, 2017
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PMJ 2017: D
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S Releases Fifth-Generation GPU Acceleration Platform for Semiconductor Manufacturing
Press Release • April 4, 2017
Latest-generation Computational Design Platform more than doubles processing speed and enables the first inline dose correction in multi-beam mask writers
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