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News
Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
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News
Community
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Page 28
Semiconductor Engineering: Will machine learning and AI improve chip manufacturing?
Publication • October 18, 2018
NVIDIA, NuFlare, Mycronic and D
2
S executives give their perspective
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VLSI Research: Video interview with Aki Fujimura, CEO of D
2
S
Publication • October 16, 2018
Dan Hutcheson talks to Aki Fujimura about the annual eBeam Initiative survey results 2018
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Deep Learning is Going to Improve Mask Manufacturing Too
Publication • September 30, 2018
Aki Fujimura pens an editorial on Deep Learning for the BACUS Newsletter
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Semiconductor Engineering: Week in Review - Deep Learning Center
News • September 14, 2018
NuFlare, Mycronic, and D
2
S Partnership tops the manufacturing news for the week
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Center for Deep Learning in Electronics Manufacturing Announced by Industry Leaders
Press Release • September 12, 2018
Alliance of NuFlare Technology, Mycronic and D
2
S using NVIDIA Technology
English
中文 (简体)
日本語
Hideaki Hontao is the new President of D
2
S KK
Press Release • September 4, 2018
Hideaki Hontao brings more than 30 years of industry experience to the role (news release is in Japanese)
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