News

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Fellow eBeam Initiative Members D2S and NuFlare Partner to Reduce Write Times for Complex 22-nm Photomask – D2S Option to NuFlare EBM-700 System Enables Design for eBeam (DFEB) Mask Technology

Press Release • March 1, 2011

D2S Option to NuFlare EBM‐7000 System Enables Design for E‐beam (DFEB) Mask Technology

eBeam Initiative Members Present Collaborative Results at SPIE Advanced Lithography Symposium 2011 – eBeam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative

Press Release • February 22, 2011

E‐beam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative

eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 – Four New Companies Join eBeam Initiative

Press Release • September 7, 2010

Four Additional Companies Join eBeam Initiative

D2S and JEOL Partner to Reduce Write Times for Advanced Photomask Production

Press Release • April 13, 2010

D2S to Provide Design for E‐beam (DFEB) Mask Technology for JEOL’s JBX‐3200MV System

eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 – Three New Companies Join eBeam Initiative

Press Release • April 13, 2010

Three New Companies Join eBeam Initiative

D2S CEO AKI FUJIMURA TO PARTICIPATE IN 22‐NM MANUFACTURING PANEL AT DAC 2010

Press Release • March 25, 2010

Panel of Experts to Discuss Design and Lithography Challenges for 22‐nm Manufacturing