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Page 28
PMJ 2017: Simulation-Based MDP Verification for Leading-Edge Masks presented by Bo Su
Publication • April 5, 2017
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Experts at the Table Part 2 – Where EUV fits, what problems still remain, and what are the alternatives by Mark LaPedus
Publication • April 5, 2017
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PMJ 2017: D
2
S Releases Fifth-Generation GPU Acceleration Platform for Semiconductor Manufacturing
Press Release • April 4, 2017
Latest-generation Computational Design Platform more than doubles processing speed and enables the first inline dose correction in multi-beam mask writers
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Solid State Technology: D
2
S unveils fifth-generation GPU-acceleration platform for semiconductor manufacturing
Publication • April 4, 2017
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Experts at the Table Part 1 – EUV’s viability still in doubt even as rollout begins by Mark LaPedus
Publication • March 16, 2017
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BACUS 2016: D
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S Releases Fourth-Generation GPU-Acceleration Platform for Semiconductor Manufacturing
Press Release • September 12, 2016
14 installations of Computational Design Platform family used by customers worldwide
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