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Dr. Pang recognized by SPIE for his outstanding achievements and contributions to the optics community, including the introduction of curvilinear ILT to the semiconductor lithography and photomask industries
Paper by Abhishek Shendre, Aki Fujimura, Mariusz Niewczas, Tom Kronmiller of D2S receives BACUS 2022 Best Paper Award
The eBeam Initiative’s 11th annual Luminaries survey in 2022 reported EUV fueling growth of the semiconductor photomask industry while a panel of experts cited a number of complications in moving to High-NA EUV during an event co-located with the SPIE Photomask Technology Conference in late September. Industry luminaries representing 44 companies from across the semiconductor ecosystem participated in this year’s survey. Aki Fujimura, CEO of D2S, Inc., the managing company sponsor of the eBeam Initiative, moderated the panel discussion. This is the second and final part of the panel discussion.
The eBeam Initiative’s 11th annual Luminaries survey in 2022 reported EUV fueling growth of the semiconductor photomask industry while a panel of experts cited a number of complications in moving to High-NA EUV during an event co-located with the SPIE Photomask Technology Conference in late September. Industry luminaries representing 44 companies from across the semiconductor ecosystem participated in this year’s survey. Aki Fujimura, CEO of D2S, Inc., the managing company sponsor of the eBeam Initiative, moderated the panel discussion.
Presented by Aki Fujimura, D2S, Inc. at eBeam Inititative event