Videos

Wednesday, October 7, 2026

Abhishek Shendre of D2S introduces the DMD feature in PLDC, which reduces proximity effect correction (PEC) squishing to improve both local and global CD uniformity with no impact on mask write times. An offline version of PLDC is now available. This is a recording of Abhishek’s paper given at BACUS SPIE Photomask.

Thursday, October 1, 2026

Aki Fujimura, CEO of D2S, speaks with Christof Klein, former COO at IMS Nanofabrication and now a consultant at advisory firm iunctio.partners, on a range of topics. Christof demystifies pixel-level dose correction (PLDC) and dynamic max dose (DMD).

Tuesday, September 8, 2026

Breaking news from the SPIE Photomask Technology + EUV conference about Large Format Photomasks announced by ASML and TSMC. Aki Fujimura, CEO of D2S, was on hand as President of BACUS to provide this update.

Thursday, June 11, 2026

Asmus Hetzel of D2S describes the limitations of current Gaussian models and introduces Freeform Point Spread Function (FF PSF) models as a solution for EUV (or any) masks.

Thursday, June 11, 2026

Leo Pang of D2S shares his insights on 2026 Photomask Japan (PMJ) with eBeam Initiative’s Angie Kellen.

Thursday, March 26, 2026

Aki Fujimura reflects on how far the industry has come in terms of computational resources and multi-beam mask writing to enable the move to curvilinear masks and design. He goes on to explain why entirely curvilinear masks are entirely manufacturable and how it matters to wafer uniformity. Recorded at the eBeam Initiative annual lunch during SPIE ALP.