Aki Fujimura reflects on how far the industry has come in terms of computational resources and multi-beam mask writing to enable the move to curvilinear masks and design. He goes on to explain why entirely curvilinear masks are entirely manufacturable and how it matters to wafer uniformity. Recorded at the eBeam Initiative annual lunch during SPIE ALP.
Mike Hadsell of Tekscend talks about IPOs, EUV and ArF mask equipment investments, AI and curvilinear trends, as well as offers career advice in this wide-ranging interview with Aki Fujimura of D2S.
Abhishek Shendre of D2S describes how PLDC can make curvy mask shapes manufactureable for improved wafer quality. Leo Pang of D2S presents Abhishek's talk in Chinese.
Jim Wiley, Chan-Uk Jeon, and Harry Levinson (pictured left to right) debate the results of this year's Luminaries Survey at the eBeam Initiative annual reception with Aki Fujimura as moderator.
SPIE BACUS Webinar Series: "All Manufacturable Shapes are Curvy: Ask for What You Can Get and Get What You Ask For," Aki Fujimura of D2S talks about curvilinear masks as well as wafer targets, with the end goal being manufacturability. Scroll to bottom of page; may require login
