Glen Scheid of Micron, Harry Levinson of HJL Lithography, and Naoya Hayashi of DNP (pictured left to right) debate the results of this year’s Luminaries Survey during SPIE PUV with Aki Fujimura as moderator. In Part 1, the panelists cover the state of the mask industry, growing equipment investments, actinic inspection, high-NA EUV broad adoption and stitching of high-NA EUV masks.
