Videos

Friday, August 29, 2025

SPIE BACUS Webinar Series: "All Manufacturable Shapes are Curvy: Ask for What You Can Get and Get What You Ask For," Aki Fujimura of D2S talks about curvilinear masks as well as wafer targets, with the end goal being manufacturability. Scroll to bottom of page; may require login

Tuesday, June 3, 2025

Leo Pang of D2S provides his takeaways from Photomask Japan, including Best Paper and Best Poster topic, PLDC.

Tuesday, June 3, 2025

Leo Pang explains why pixel-level dose correction (PLDC) could be the most significant topic at PMJ 2025, from Micron’s talk on PLDC vs off-line MPC for curvilinear and Manhattan features (Best Paper Award at PMJ), to Tekscend and NuFlare’s joint-poster on PLDC results for N-CAR resist patterns (Best Poster Award at PMJ).

Wednesday, March 26, 2025

Aki Fujimura of D2S on how PLDC improves uniformity and linearity for all masks

Monday, October 28, 2024

Aki Fujimura, CEO of D2S, sits down with Jed Rankin of IBM to discuss his leadership of the BACUS Steering Committee and changing the SPIE PUV Conference.

Monday, October 28, 2024

Glen Scheid of Micron, Harry Levinson of HJL Lithography, and Naoya Hayashi of DNP (pictured left to right) debate the results of this year’s Luminaries Survey during SPIE PUV with Aki Fujimura as moderator. Part 2 covers mask writer costs, EUV pellicles, curvilinear ILT and the extendibility of 193i.