Videos

Page 10

Monday, March 16, 2015

Semiconductor Engineering: Video Tech Talk on Moore’s Law – Device scaling isn’t slowing down, but it is changing; Ed Sperling interviews Aki Fujimura

Thursday, December 11, 2014

eBeam Initiative: Semiconductor Engineering Tech Talk – Inverse Lithography by Leo Pang, D2S

Monday, October 13, 2014

eBeam Initiative: Aki Fujimura, CEO of D2S, explains how context-dependent mask effects require simulation-based MDP; video in English and in Japanese

English 日本語

Saturday, June 14, 2014

eBeam Initiative: Aki Fujimura describes how the acquisition of Gauda and the hiring of Dr. Leo Pang will enable D2S to better support the eBeam community

Tuesday, March 18, 2014

eBeam Initiative: Aki Fujimura explains the mask hotspots trend

English 日本語

Monday, May 20, 2013

eBeam Initiative: Ryan Pearman of D2S discusses everything you wanted to know about resist effects in his second installment on Photomask Processing and Modeling in the Fine Line Spring Edition