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Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
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News
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Page 10
Wednesday, March 27, 2019
Aki Fujimura, CEO of D
2
S, provides his takeaways from SPIE-AL and an update on the Center for Deep Learning in Electronics Manufacturing (CDLe)
English
日本語
Wednesday, October 17, 2018
eBeam Initiative: Shot Talk catches up on the 2018 Photomask Technology Conference with Aki Fujimura and Leo Pang
English
中文
日本語
Wednesday, June 6, 2018
eBeam Initiative: Deep Learning interview with Steve Teig, Xperi, by Aki Fujimura, D
2
S
English
Wednesday, June 6, 2018
eBeam Initiative: Aki Fujimura and Leo Pang of D
2
S on Semiconductor and Photomask Growth, Summer 2018 Shot Talk
English
中文
日本語
Thursday, March 22, 2018
eBeam Initiative: Shot Talk recaps SPIE 2018 with Aki Fujimura, Leo Pang of D
2
S
English
中文
日本語
Tuesday, October 10, 2017
eBeam Initiative: Aki Fujimura, CEO of D
2
S, and Leo Pang, Chief Product Officer, recap the latest eBeam Initiative surveys and more.
English
中文
日本語
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