eBeam Initiative: Ryan Pearman of D2S explains why shapes taped out are not the shapes on the mask in the first part of a series on Photomask Processing and Modeling in the Fine Line Winter Edition
weSRCH: Mask writing technology at 20nm and below ....Video interview with G. Dan Hutcheson and Aki Fujimura (Login with username “[email protected]”, password=“eBeam2012”)
