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Tuesday, April 19, 2022

Leo Pang of D2S provides an overview of the evolution of ILT from his SPIE JM3 ILT review paper published in 2021

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Tuesday, April 19, 2022

Aki Fujimura interviews Mike Hermes, vice president of mask technology at Micron, about the changing landscape in mask making, including the shift to multi-beam mask writing and curvilinear masks

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Tuesday, October 26, 2021

Aki Fujimura explains why curvilinear mask shapes are important for both photomask and wafer manufacturers

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Tuesday, October 26, 2021

Aki Fujimura, CEO of D2S, interviews Naoya Hayashi of DNP on his impressions of the SPIE Photomask Technology conference

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Friday, October 1, 2021

SPIE Photomask Technology 2021: A General Formula for Deep Learning Success in Semiconductor Manufacturing

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Tuesday, September 28, 2021

eBeam Initiative Virtual Event during the 2021 Photomask Technology Conference, Sept. 28, 2021 Panelists are Tom Cecil (Synopsys), Chris Progler (Photronics) and Mikael Wahlsten (Mycronic), moderated by Aki Fujimura (D2S). To view only the discussion on the 2021 Luminaries survey results, mask revenues, EUV masks, mask writers, DL, or curvilinear masks, go to the homepage of eBeam.org

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