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Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
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About D
2
S
Timeline of D
2
S Technology Highlights
Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
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Page 19
Semiconductor Engineering: Bending The Rules With Curvilinear Technology
News • April 5, 2021
TSMC’s Danping Peng looks at the historical hurdles for this technology.
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SEMI: “Innovating for the Future! Electronic System Design –– Where Microelectronics Begins”
News • March 19, 2021
Video: D
2
S CEO Aki Fujimura participates in panel with other industry experts
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Semiconductor Engineering: The Future of Transistors and IC Architectures
News • March 18, 2021
D
2
S CEO Aki Fujimura among the industry experts to offer views on the need for more compute power
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Semiconductor Engineering: Deep Learning (DL) Applications in Photomask to Wafer Semiconductor Manufacturing
News • March 17, 2021
D
2
S and fellow eBeam Initiative member contribute to this DL survey
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Semiconductor Engineering: The Benefits Of Curvilinear Shapes On Photomasks
News • March 15, 2021
Using curvilinear shapes to increase process windows for advanced memory.
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SEMI Panel Touts Innovation from Electronic System Design Ecosystem
News • March 12, 2021
D
2
S CEO Aki Fujimura participates in “Innovating for the Future! Electronic System Design –– Where Microelectronics Begins” panel
Read More
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