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Linyong Pang, Suhas Pillai, Thang Nguyen, Mike Meyer, Ajay Baranwal, Henry Yu, Mariusz Niewczas, Ryan Pearman, Abhishek Shendre, Aki Fujimura, “Making digital twins using the Deep Learning Kit (DLK),” Proc. SPIE 11148, Photomask Technology 2019 (October 21, 2019). DOI: https://doi.org/10.1117/12.2538508
Experts at the Table: EUV mask making requires certain tools, but are the solutions ready?
Dan Hutcheson's conversation with Aki Fujimura of the eBeam Initiative
Why Inverse Lithography Technology has Finally Come of Age
D2S has built a GPU-based supercomputer that cracks the last problem in speeding up optical lithography