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Semiconductor Engineering: Manufacturing Bits

Publication • September 17, 2019

Full-Chip Inverse Lithography
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D2S Enables “Stitchless” Full-Chip Inverse Lithography Technology in a Single Day for the Multi-Beam Era

Press Release • September 16, 2019

TrueMask®® ILT employs a unique GPU-accelerated approach that emulates a single, giant GPU/CPU pair that can compute an entire full-chip ILT solution at once
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Semiwiki: Aki Fujimura at ES Design West

News • July 29, 2019

The Wild, Wild SEMICON West TechTALK – Joe Costello Speaks Out
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CIO Review: D2S Named One of 20 Most Promising HPC Solution Providers - 2019

News • July 26, 2019

Aki Fujimura: Digital Twins are Essential for Deep Learning in Semiconductor Manufacturing
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Semiconductor Engineering: EUV, Deep Learning Issues In Mask Making

Publication • July 1, 2019

Experts at the Table: Deep learning is a hot topic, but can the industry use it for mask making? (Part 3)
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D2S Introduces GPU-Accelerated Deep Learning Kit Tailored for Photomask and Semiconductor Manufacturing R&D Teams

Press Release • April 15, 2019

TrueMask® DLK includes rigorous eBeam mask and ArF/EUV lithography simulators from OEM partners for deep learning training
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