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Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
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PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
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About D
2
S
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2
S Technology Highlights
Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
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S
Timeline of D
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Page 20
Semiconductor Engineering: Breaking The 2nm Barrier
News • February 18, 2021
D
2
S CEO Aki Fujimura among the industry experts to offer views on what will be important to make 2nm and beyond successful
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Panel: Innovating for the Future! Electronic System Design – Where Microelectronics Begins
News • February 2, 2021
Aki Fujimura, CEO of D
2
S, participates in the panel February 18, 2021, hosted by SEMI ESDA as part of the new Technologies Unite Global Summit
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EE News Europe: Petaflop era for semiconductor manufacturing
News • February 2, 2021
Computational Design Platform from DS2 with Nvidia A40 GPU achieves 1.8 PFLOPS for designing masks
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HPC Wire: D
2
S Unleashes the Petaflops Computing Era for Semiconductor Manufacturing
News • January 27, 2021
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D
2
S Unleashes the PetaFLOPS Computing Era for Semiconductor Manufacturing
News • January 26, 2021
Latest-generation Computational Design Platform with NVIDIA A40 GPU Achieves 1.8 PFLOPS
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VLSI Research: 2020 Mask Maker's Survey
News • December 17, 2020
Dan Hutcheson's conversation with Aki Fujimura of the eBeam Initiative
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