News

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Lithography Luminary Dr. Leo Pang Joins D2S as Chief Product Officer

Press Release • May 12, 2014

GPU Based Lithography Simulation and OPC

Publication • February 1, 2014

University of Massachusetts Amherst Masters Thesis by Lokesh Subramay

D2S and NuFlare Extend Partnership to Accelerate eBeam Computational Design Platform Deployment for Advanced Photomasks

Press Release • September 9, 2013

Ecosystem Quote Sheet for TrueMask® MDP — the First and Only Model‐Based Mask Data Preparation Solution to Process Full‐Chip Design Data for Production Applications

News • September 11, 2012

D2S Unveils eBeam Solution that Both Reduces Photomask Write Time and Improves Photomask Accuracy at 20‐nm Node and Beyond

Press Release • September 11, 2012

TrueMask® MDP is the First and Only Model‐Based Mask Data Preparation Solution to Process Full‐Chip Design Data for Production Applications

eBeam Initiative Roadmap to Focus on Semiconductor Photomask Critical Dimension Uniformity at SPIE Advanced Lithography 2012 Symposium – Proof Points at SPIE demonstrate the ability of eBeam Technologies to Improve 20-nm and 14-nm Wafer Yields

Press Release • February 13, 2012

Proof points at SPIE Advanced Lithography demonstrate the ability of eBeam technologies to improve 20‐nm and 14‐nm wafer yields