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The critical success factor
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Shape-agnostic computing
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MPC for uniformity and linearity
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Physical model for masks and wafers
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Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
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Page 30
Latest eBeam Survey Results Are In
News • October 10, 2017
Aki Fujimura and Leo Pang recap the latest developments.
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D
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News • October 10, 2017
We’re honored to be named as one of the 20 most promising HPC solution providers for 2017.
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Summer 2017 Edition of Shot Talk Released
News • June 26, 2017
Aki Fujimura and Leo Pang highlight the company’s latest developments as it celebrates its 10th anniversary.
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PMJ 2017: Model-Based MPC Enables Curvilinear ILT Using Either VSB or Multi-Beam Mask Writers presented by Leo Pang
Publication • April 5, 2017
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PMJ 2017: EUV Modeling in the Multi-Beam mask making Era presented by Ryan Pearman
Publication • April 5, 2017
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PMJ 2017: Simulation-Based MDP Verification for Leading-Edge Masks presented by Bo Su
Publication • April 5, 2017
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