News

Page 31

D2S Taps Industry Semiconductor EDA Veteran to Serve as Vice President of Engineering

Press Release • March 29, 2011

D2S Fills Critical Role as Momentum Builds to Support Cost‐Effective 20‐nm Optical Lithography

Fellow eBeam Initiative Members D2S and NuFlare Partner to Reduce Write Times for Complex 22-nm Photomask – D2S Option to NuFlare EBM-700 System Enables Design for eBeam (DFEB) Mask Technology

Press Release • March 1, 2011

D2S Option to NuFlare EBM‐7000 System Enables Design for E‐beam (DFEB) Mask Technology

eBeam Initiative Members Present Collaborative Results at SPIE Advanced Lithography Symposium 2011 – eBeam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative

Press Release • February 22, 2011

E‐beam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative

eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 – Four New Companies Join eBeam Initiative

Press Release • September 7, 2010

Four Additional Companies Join eBeam Initiative

D2S and JEOL Partner to Reduce Write Times for Advanced Photomask Production

Press Release • April 13, 2010

D2S to Provide Design for E‐beam (DFEB) Mask Technology for JEOL’s JBX‐3200MV System

eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 – Three New Companies Join eBeam Initiative

Press Release • April 13, 2010

Three New Companies Join eBeam Initiative