News

Yoshio Tanaka Joins D2S, Inc. as Vice President to Drive New Business Development in Japan

Press Release • September 8, 2014

D2S Expands GPU Acceleration Capability for Advanced Semiconductor Lithography and Photomask Manufacturing with Acquisition of Gauda

Press Release • June 3, 2014

Latest-generation Computational Design Platform more than doubles processing speed and enables the first inline dose correction in multi-beam mask writers.

English

日本語

Lithography Luminary Dr. Leo Pang Joins D2S as Chief Product Officer

Press Release • May 12, 2014

English

日本語

GPU Based Lithography Simulation and OPC

Publication • February 1, 2014

University of Massachusetts Amherst Masters Thesis by Lokesh Subramay

D2S and NuFlare Extend Partnership to Accelerate eBeam Computational Design Platform Deployment for Advanced Photomasks

Press Release • September 9, 2013

English

日本語

Ecosystem Quote Sheet for TrueMask® MDP — the First and Only Model‐Based Mask Data Preparation Solution to Process Full‐Chip Design Data for Production Applications

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Yoshio Tanaka Joins D2S, Inc. as Vice President to Drive New Business Development in Japan

Press Release • September 8, 2014

D2S Expands GPU Acceleration Capability for Advanced Semiconductor Lithography and Photomask Manufacturing with Acquisition of Gauda

Press Release • June 3, 2014

Lithography Luminary Dr. Leo Pang Joins D2S as Chief Product Officer

Press Release • May 12, 2014

GPU Based Lithography Simulation and OPC

Publication • February 1, 2014

D2S and NuFlare Extend Partnership to Accelerate eBeam Computational Design Platform Deployment for Advanced Photomasks

Press Release • September 9, 2013

Ecosystem Quote Sheet for TrueMask® MDP — the First and Only Model‐Based Mask Data Preparation Solution to Process Full‐Chip Design Data for Production Applications

News • September 11, 2012