News

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eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 – Four New Companies Join eBeam Initiative

Press Release • September 7, 2010

Four Additional Companies Join eBeam Initiative

D2S and JEOL Partner to Reduce Write Times for Advanced Photomask Production

Press Release • April 13, 2010

D2S to Provide Design for E‐beam (DFEB) Mask Technology for JEOL’s JBX‐3200MV System

eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 – Three New Companies Join eBeam Initiative

Press Release • April 13, 2010

Three New Companies Join eBeam Initiative

D2S CEO AKI FUJIMURA TO PARTICIPATE IN 22‐NM MANUFACTURING PANEL AT DAC 2010

Press Release • March 25, 2010

Panel of Experts to Discuss Design and Lithography Challenges for 22‐nm Manufacturing

eBeam Initiative Membership Grows to 27 - Initiative Introduces DFEB Mask Roadmap for High Volume Integrated Circuits

Press Release • February 23, 2010

Initiative Introduces Design For E‐Beam Mask Roadmap for High‐Volume Integrated Circuits

D2S Redefines Mask Rules for the 22-nm and Smaller Technology Nodes

Press Release • February 23, 2010

Design for eBeam (DFEB) Mask Technology Makes Advanced Photomask Production Practical