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Page 6
Tuesday, September 22, 2020
Aki Fujimura, CEO of D
2
S, moderates the eBeam Initiative panel on mask survey results at SPIE Photomask Technology Conference 2020
English
Tuesday, June 2, 2020
Leo Pang, Chief Product Officer of D
2
S, reviews a unique GPU-accelerated approach to curvilinear inverse lithography technology (ILT) and introduces mask-wafer co-optimization (MWCO).
English
Tuesday, March 17, 2020
Aki Fujimura of D
2
S with SPIE AL 2020 highlights, including EUV, Deep Learning, curvilinear masks
English
日本語
Tuesday, March 17, 2020
Leo Pang of D
2
S also recaps SPIE-AL 2020 developments
中文
Tuesday, October 15, 2019
Dr. Leo Pang of D
2
S explains the importance of ILT digital twins in today’s growing curvilinear ILT world
English
Tuesday, October 15, 2019
Aki Fujimura, CEO of D
2
S, provides key takeaways from the recent Photomask Technology Conference
English
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