Leo Pang, Chief Product Officer of D2S, reviews a unique GPU-accelerated approach to curvilinear inverse lithography technology (ILT) and introduces mask-wafer co-optimization (MWCO).
eBeam Initiative: In this Tech Talk, presented at Photomask Japan, D2S modeling expert Ryan Pearman examines the effects of curvilinear mask data on wafer variability and explains why curvilinear features are needed for EUV lithography.
