eBeam Initiative: In this Tech Talk, presented at Photomask Japan, D2S modeling expert Ryan Pearman examines the effects of curvilinear mask data on wafer variability and explains why curvilinear features are needed for EUV lithography.
eBeam Initiative: Shot Talk Aki Fujimura and Leo Pang of D2S recap the launch of the D2S TrueMask® DLK deep learning kit and “hot topics” from the Photomask Japan Conference.
